PECVD Lab.
PECVD Lab.
□ Dual Frequency PECVD System
- Synthesis of barrier and anti-scratch thin films for display panel
- Source size: φ 8 inch
- Film materials: SiOx, SiON
□ VHF(UHF) assisted RF-PECVD System
- Synthesis of silicon and silicon compound thin films for solar cell and TFT device
- Source size: φ 8 inch
- Film materials: a-/µc-Si (doped/undoped), SiNx
□ RF-PECVD System
- PECVD equipment for plasma diagnostics
- Source size: φ 2 inch
- Film materials: SiOx, SiON
□ Microwave / RF PECVD System
- Synthesis of carbon based thin films
- Source size: φ 4 inch
- Film materials: porous carbon, CNT, DLC


Dual Frequency PECVD System
- Synthesis of barrier and anti-scratch thin films for display panel
- Source size: φ 8 inch
- Film materials: SiOx, SiON


VHF(UHF) assisted RF-PECVD System
- Synthesis of silicon and silicon compound thin films for solar cell and TFT device
- Source size: φ 8 inch
- Film materials: a-/µc-Si (doped/undoped), SiNx


RF-PECVD System
- PECVD equipment for plasma diagnostics
- Source size: φ 2 inch
- Film materials: SiOx, SiON


Microwave / RF PECVD System
- Synthesis of carbon based thin films
- Source size: φ 4 inch
- Film materials: porous carbon, CNT, DLC