Energy Harvesting Film
Energy Harvesting Thin Film
1) Thin Film Solar Cell
- Thin film materials: microcrystalline Si thin film, Si:Ge thin film
- Thin film properties: crystalline volume fraction: 30 ~ 75 %, defect density < 1 x 1016 #/cm3
- Substrate materials: glass, polymer (PC, PET, PI, etc.), stainless steel sheet
- Coating process: ultra high density PECVD using RF, VHF, and UHF hybrid
- Coating temperature: 100 ~ 300 ℃
- Key technologies: Synthesis of microcrystalline Si thin film with ultra high growth rate (1.0 ~ 2.0 nm/sec) and low defect density

2) Electrode Materials for Fuel Cell
- Thin film materials: conductive carbon thin film
- Thin film properties: nanocrystalline (10 nm) graphite structure, resistivity (1 x 10-3 ohmcm)
- Substrate materials: glass, polymer, stainless steel sheet
- Coating process: high density plasma magnetron sputtering
- Coating temperature: 50 ~ 100 ℃
- Key technologies: Synthesis of nanocrystalline conductive carbon thin film controlled by plasma density and electron temperature at low temperature

Figure A. Crystaliine volume fraction as a function of process conditions
□ UHF-RFPECVD
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□ Sputtering
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